CompIntelligence EPM experts use a time-tested methodology that empowers clients to participate fully throughout the planning, design and development of their application. Our goal is to deliver a successful implementation on time and under budget leaving clients self-sufficient to administer their application and support their end users.
Well Defined Requirements ——> Requirements Definition
We review current client capabilities and provide best practice approaches based on more than 15 years of successful implementation experience to help you establish clear and concise business requirements.
A Strong Plan ——> Project Planning
We review current resources, skills and availability to assist in defining a realistic project plan that sets the right expectations with stakeholders
The Right Design ——> Design
We work with the client’s trained project team to review several application design options to ensure it is practical, maintainable and efficient.
Educated Decisions ——> Training
We provide comprehensive training for stakeholders, administrators and end users on the project team in the functional and administrative capabilities of the solution enabling everyone to speak the same language when making design decisions and building the application.
Follow Through ——> Support
We provide a thorough project review and tailor on-going support through EpmXsourcing, our flexible support program.
The Right Resources ——> Staffing and Placement
We help hire the right staff to administer applications on a temporary or permanent basis by tapping into our broad network of experienced Hyperion personnel.
The CompIntelligence methodology has its roots in the approach used by the inventors of the enterprise performance management space, and we continue to improve on it with each and every project we engage in.
To find out more about why our implementation methodology is unique and how we can help successfully implement your EPM solution, complete the Contact Us form on the right. We’ll contact you to set up a convenient time to talk further.